CMC

Review Notes for October 5, 2000 


Overview

Prof. Roxann Engelstad


  
 

Optical Mask Modeling Update

Eric Cotte
Optimization of Thin Films for Attenuated Phase Shifting Masks
 

 

SCALPEL Mask Modeling Update

Edward Lovell
SCALPEL Pattern - Specific Modeling
 

 
 

Thin Film Characterization

Anton Jachim
Interpretation of Thin Film Stress from Wafer Shape
 
 

 
 
 
 


Questions, Comments? email: dmrumpf@students.wisc.edu