CMC

Review Notes for May 4, 2000 


Overview

Prof. Roxann Engelstad


 


 
 
 

Optical Mask Modeling

 

Andy Mikkelson
Pattern Transfer - Orthotropic Features

 
 

Eric Risius
Pattern Transfer - Phase Shifting Masks
 
 

W. Semke, L. Siewert, E. Risius, and N. Tang
Pellicle Induced Distortions

 
 

Amr Abdo
Exposure - Materials Study

 
 

 
 
 
 
 


Questions, Comments? email: dmrumpf@students.wisc.edu