CMC

Review Notes for March 7, 2001 


Overview

Prof. Roxann Engelstad


 



  
 
 

EUV Mask Modeling Update

Prof. Roxann Engelstad
Mounting Effects on Image Placement Errors
 
 

 

Optical Mask Modeling Update

Jaewoong Sohn
Predicting Pattern-Specific Distortions during Patterning
 

 
 

EUV Mask Modeling Update

Carl Martin
Thermomechanical Modeling during Exposure
 
 

 

 


Questions, Comments? email: dmrumpf@students.wisc.edu