CMC

Review Notes for December 2, 1999 


Overview

Prof. Roxann Engelstad


 



 
 
 
 

Optical Mask Modeling Update
 
 

Lowell Siewert, Eric Risius, and Andy Mikkelson
Assessment of Pellicle Mechanical Characteristics
   
 

Jaewoong Sohn
Simulating E-Beam Patterning of CaF2 Substrates

 


Eric Risius 
Mechanical Modeling of Attenuating Phase-Shift Masks


 



 
 

EUV Mask Modeling Update

 

Phil Reu
Stress Gradient Effects on Mask Fabrication


 

 


 

IPL and EPL Mask Modeling Update

 

Gary Frisque
Modeling Pattern Transfer in Perforated Membranes

 
 


 


 
 
 
 


Questions, Comments? email: dmrumpf@students.wisc.edu