Optical Mask Modeling Update

Andrew Mikkelson

Pattern Transfer Distortions in Optical Photomasks

Alexander Wei

Finite Element Analysis of Localized Heating in 

Optical Substrates Due to E-beam Patterning
 

EUV Mask Modeling Update

Phil Reu

Modeling Mask Fabrication and Pattern Transfer 

Distortions for EPL Stencil Masks

Questions, Comments? email: dmrumpf@students.wisc.edu